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[[image:scat96.gif|thumb]]
{{Software
|Picture=Scat96.png
|Version=
|Vendor=
|Author=[[Alger Pike]]
|License=
|Download=
|Website=[http://web.archive.org/web/19990417230435/http://avenger.mri.psu.edu/scat96.html Archived Site]
}}
Ion simulation application
Ion simulation application


This application simulates the secondary ion mass spectrometry (SIMS) process. It bombards the substrate atoms with a projectile of high energy. It then follows this trajectory through the crystal and calculates the amount of energy imparted to the surface. This information can be used to determine how the atoms of the surface will eject from it. By measuring these ejected ions one can gain information on surface structure. It also reveals surface composition as this technique is mass sensitive.
This application simulates the secondary ion mass spectrometry (SIMS) process. It bombards the substrate atoms with a projectile of high energy. It then follows this trajectory through the crystal and calculates the amount of energy imparted to the surface. This information can be used to determine how the atoms of the surface will eject from it. By measuring these ejected ions one can gain information on surface structure. It also reveals surface composition as this technique is mass sensitive.


==License==
[[Category:Physics]]
Author: [[Alger Pike]]
 
==Links==
 
[[Category:Software]]

Latest revision as of 05:49, 21 January 2024

Scat96
Version
Vendor
Author Alger Pike
License
Download
Website Archived Site

Ion simulation application

This application simulates the secondary ion mass spectrometry (SIMS) process. It bombards the substrate atoms with a projectile of high energy. It then follows this trajectory through the crystal and calculates the amount of energy imparted to the surface. This information can be used to determine how the atoms of the surface will eject from it. By measuring these ejected ions one can gain information on surface structure. It also reveals surface composition as this technique is mass sensitive.