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IBM drives chipmaking process beyond current limitations
San Jose (CA) - IBM researchers claim to have found a way to use current deep-ultraviolet (DUV) lithography techniques for the production of 32nm chips and smaller. While The limits of DUV have been pushed out several times, the semiconductor industry plans to make a costly switch to an extreme ultraviolet (EUV) process in 2009. IBM's discovery could delay the transition for at least one more product generation. ...
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